Synthesis of three-dimensional photonic crystals by interference lithography with low light absorbtion
Автор: Yury Vladimirovich miklyaev Y.V., Serguei Vladimirovich karpeev S.V., Pavel Nikolaevich dyachenko P.N., Vladimir Sergeevich pavelyev V.S., Serguei Dmitrievich poletaev S.D.
Журнал: Компьютерная оптика @computer-optics
Рубрика: Дифракционная оптика, оптические технологии
Статья в выпуске: 4 т.32, 2008 года.
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Polymer templates of photonic crystals are fabricated by means of interference lithography. Gratings are recorded in SU-8 photoresist by He-Cd laser radiation at 442nm wavelength. Radiation with this wavelength corresponds to low absorption in photoresist. This allow us to get homogenious illumination in depth of the photomaterial. Optimal parameters of exposition and photoresist processing are defined for fabrication of porous structures. The produced structures have orthorhombic symmetry.
Фоторезист su-8, photonic crystal, interference lithography, he-cd laser, photoresist su-8
Короткий адрес: https://sciup.org/14058843
IDR: 14058843
