Study of composition of residual and plasma-forming gases in the vacuum coaters

With the help of a quadrupole mass spectrometer the authors study the composition of the residual gas in a vacuum chamber installation ARM NTP in the preparation of equipment for mining technology radio-reflective magnetron sputtering coating. It is shown that at filling the chamber with pure argon the plasma gas may contain up to 0.3 % of residual impurities from the gas chamber, including water and 0.02 % oxygen. The high content of carbon-containing gases shows the presence of residues of the solvents used, sorbed in rubber seals, equipment and gaps in other parts of the camera. To reduce the contamination of plasma-forming chamber atmosphere and to improve the purity of the composition and properties of the coatings the additional cleaning and degassing chamber surfaces of residual moisture and carbon-containing compounds are required. To ensure the minimum contamination of the sprayed coating it is necessary to take measures for thorough cleaning and degassing of the chamber surfaces from residual moisture and carbon-containing compounds.