Optimization of the vacuum chamber mechanism at manufacturing optical coatings

Uniformity of optical films thickness deposited on large details or cartridges with a lot of substrates has vital importance at industrial manufacturing of multilayered optical coatings. In this paper the dependence of geometrical parameters of the vacuum chamber mechanism providing the best uniformity on thickness of a deposited layer is considered. Existence of an optimum set of geometrical parameters of the vacuum chamber providing the best uniformity of the layer is shown. Non-uniformity on thickness of the film can not exceed 10-4-10-6 on all surface of a substrate at some positional relationship of these geometrical parameters.