Investigation of magnetron sputtering regimes of titanium thin films for cryogenic detectors
Автор: Lyakhov I.G., Kuzmin A.A., Ilin A.S., Ermakova M.A., Bulakh K.V.
Журнал: Труды Московского физико-технического института @trudy-mipt
Рубрика: Нанотехнология и нанометрия
Статья в выпуске: 1 (17) т.5, 2013 года.
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We report the investigation of titanium thin films obtained in various regimes of magnetron sputtering on a silicon substrate by means of electrical measurements at Т = 300 K and 77 K, atomic force microscopy (AFM) and X-ray diffractometry (XRD). It is shown how the residual resistivity of the films (and the critical superconducting transition temperature Тс) depends on the parameters of deposition. The data is compared with measurements on the AFM and XRD.
Superconducting bolometers, transition edge sensors, superconducting titanium thin films, express method for estimating the critical temperature, x-ray diffractometry
Короткий адрес: https://sciup.org/142185898
IDR: 142185898
