Investigation of Cu / Cu4RbCl3I2 heterojunction at high potentials

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The investigations are carried out by potentiostatic method. It is found out, that on the heterojunction the copper dissolution-deposition electrochemical reaction takes place depending on potential. sign. In the interval 10 mV 120 mV the reaction rate is limited by charge transport at exchange current density of 2,7 mA cm-2 and anodic transfer coefficient approximately 0,45.

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IDR: 148197731

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