Electronic lithography as the most innovative lithography method
Автор: Luniakina T.A.
Журнал: Форум молодых ученых @forum-nauka
Статья в выпуске: 5-2 (21), 2018 года.
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The article deals with existing modern lithography methods. There are described the general steps of the lithography process in semiconductor production. There are considered the tendencies of semiconductor industry development as a whole. There was made the analysis of lithography methods based on information about the modern semiconductor industry and the most innovative lithography method was chosen: electron beam lithography, as a method that allows to increase the technological level of the semiconductor industry.
Semiconductor, semiconductor manufacturing, mems, photolithography, exposure, etching, wavelength, photomask, lithography, si, wafer per hour
Короткий адрес: https://sciup.org/140282752
IDR: 140282752
