Эллипсометрический контроль динамики роста толщины пленки окислов железа

Ellipsometric control of the dynamics of iron oxide film thickness growth

This scientific article presents a comprehensive study on the application of spectroscopic ellipsometry for monitoring the dynamics of iron oxide film growth on an iron substrate, with implications for nondestructive corrosion diagnostics. The research focuses on analyzing the dependence of key ellipsometric parameters, Psi (Ш) and Delta (Д), on the thickness of the oxide film. The experimental and theoretical investigations were conducted using a two-layer optical model, comprising an iron substrate and an oxide film, with known dielectric constants. Measurements and simulations were performed at three distinct angles of incidence: 30°, 45°, and 60°, at a wavelength of 0.64 μm. The results demonstrate that both ellipsometric parameters exhibit a distinct oscillatory dependence on film thickness. The study establishes that the sensitivity of the method is highly dependent on the angle of incidence, with the 60° angle providing the highest sensitivity to minute changes in film thickness in the nanometer range. The 30° angle proved more reliable for measuring thicker films (>150 nm), while 45° offered an optimal compromise between sensitivity and accuracy. A notable sharp change in the parameter Д within the 50–100 nm thickness range was observed, potentially indicating a phase transition within the oxide layer.