Mathematical model of the device for surface contamination control on substrate by speed spreading of the drop liguid

The problem under consideration includes a simulation of the spreading of liquid on the substrate surface. The possibility of determination the concentration of foreign atoms on the surface of the sample to change in the parameters of the light flux passing through the structure of the fluid substrate is shown. The basic equations describing the process of spreading of liquid droplets on the surface of the substrate, allowing determining numerical value of the concentration of atoms and molecules adsorbed by the surface of the sample, are described. The possibility of implementing rapid control of the purity of the substrate surface, using the measurement of the light flux at the photodetector, which is located on the focal axis of the dynamically changing lenses formed by spreading drop, is shown.