Surface metrology of semiconductor structures

This article is devoted to the study of the surface of semiconductor structures. In electronics, various semiconductor devices are widely used. Their surface and properties play a very significant role in production and future use. A product from a semiconductor wafer with a defect will not function fully, therefore, in order to prevent the output of defective products, and the students' skills have become a posteriori, a complex of research and measurements should be carried out. Therefore, the development of fairly simple and reliable methods and instruments to control the flatness of semiconductor wafers in an automated industrial production is a key point.