Modeling of refraction factor in linear and nonlinear modes for nanostructure sitall

The mathematical modeling of refraction factor in linear and nonlinear modes for nanostructure sitall is carried out. The analytical method is based on model of a movement intense oscillator, exposed to action of an external light. It is shown, that the nonlinear mode of a movement is accompanied by self-influence, and also possible generation of the second and third harmonics. The error of a method is appreciated which makes 3 - 4 %. Factor nonlinear rigidity for nanostructure sitall is found. The analysis of dependences determining change of a refraction parameter from intensity of light, has shown presence three characteristic sites - detained nonlinear mode, spasmodic growth and flat almost linear growth of a refraction parameter.