Modeling of chemical vapor deposition for growth of thin films

Most of the tasks that are associated with many aspects of nanotechnology development are essentially interdisciplinary by its nature. One of the most striking example is the use of gas-phase synthesis problems in nanotechnology. In essence, these technologies are the realization of the processes of the solid state chemical deposition from gaseous substance supplied to the reaction zone. A classic experiment in the learning process has shown its weakness: not clear; does not allow to study the dependence of the final material characteristics from the different physical parameters of the system; time consuming and expensive. By these reasons experiment was replaced by a virtual experiment i.e. simulation. At the base of the work lies the development and testing of mathematical models using high-performance computing in the processes of gas-phase synthesis of nanostructures and nanomaterials in order to study and provide visualization of proceeding physical and chemical processes.