Modeling the growth of thin films of lead molybdate PbMoO4 by sputtering with ion beams

The article discusses the growth of thin films of molybdate lead PbMoO4 by sputtering with ion beams. The method of ion beam sputtering has several advantages compared to other methods. Thus, conducting experiments in vacuum conditions significantly affects their integrity; the working chamber is separated from the area of discharge combustion, which allows controlling the process of growing coatings. We have proposed two techniques for growing thin films of PbMoO4 by independent sputtering Pb (lead) and Mo (molybdenum) targets, as well as by sputtering PbO and MoO3 with the formation of streams of particles incident on the surface of the substrate, where the synthesis of lead molybdate occurs. Modeling is carried out depending on the technological parameters through the use of MathCAD mathematical program. We have suggested optimal modes of growth processes.