Features of the structure of Cu-C composite films obtained by the ion-plasma method

The problem of applying and determining the phase composition of a copper-carbon coating of submicron thickness on a silicon substrate is being solved. The film was deposited using the ion-plasma method of simultaneous electric arc sputtering of copper and carbon from two evaporators. The advantage of this approach is the ability to control the concentration of the corresponding components in the arc discharge and thereby obtain smooth films of different chemical and phase compositions. As a result of analyzing the composition and structure of the films using various methods, it was established that amorphous carbon, nanographites with a size of ~ 5 nm, and nanoparticles of the copper carbide compound Cu2C2 are formed in the deposited film. The result obtained is of interest for solving the problem of creating efficient field emission cathodes.