Prediction of errors in photometry with the use of accumulation of errors law and Monte Carlo method

During computing experiment, in combination of the accumulation of errors law and Monte Carlo method, the influence of solution-making errors, blank experiment errors and optical transmission measurement errors upon metrological performance of photometrical analysis has been studied. It has been shown that the results of prediction by analytical and statistical methods are interconsistent. The unique feature of Monte Carlo method has been found to enable prediction of the accumulation of errors law in photometry. For the version of routine analysis the influence of heteroscedasticity of dispersion along calibration curve upon analysis quality has been studied.