The properties of titanium nitride films, obtained by magnetron sputtering
Автор: Yuryev Yuriy, Mikhnevich Kseniya, Krivobokov Valeriy, Sidelyov Dmitriy, Kiselyova Dariya, Novikov Vadim
Журнал: Известия Самарского научного центра Российской академии наук @izvestiya-ssc
Рубрика: Современные наукоемкие инновационные технологии
Статья в выпуске: 4-3 т.16, 2014 года.
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The titanium nitride (TiN) thin films of polycrystalline structure (110), (200) and (220) with hardness 9.7-22.6 GPa and elastic modulus 153.2-395.7 GPa were obtained by means of magnetron sputtering of titanium cathode in argon and nitrogen. The electrical resistance of the samples is in the range of 0.15-1.24 mΩ·cm. The effects of phase composition, microstructure, morphology and physical-mechanical properties of TiN on d s-t and N 2 flow rate are presented.
Titanium nitride, magnetron sputtering, thin films, reactive deposition
Короткий адрес: https://sciup.org/148203276
IDR: 148203276
