The impact of the photon processing and temperature on the conductivity of In 2O 3 films produed with autowave oxidation

Indium oxide films were synthesized by auto-wave oxidation reaction on the cover glass, quartz and single crystal MgO. The film thickness was measured with a mode «cross-section» scanning electron microscope and was ~ 300 nm. Optical band gap of indium oxide was ~3.5 eV. The study of In2O3 film resistance versus temperature in the dark conditions showed that when heated to 100 °C the resistance increases by about 10 %. It is shown that the_ films electric resistance decreases sharply under photo radiation and the maximum change was 52 % at room temperature. The two film resistance relaxation rates after irradiation have been determined to be 15 Ohm/s the first 30 seconds and 7 Оhm/s f for the rest, respectively. On the basis of the above stated the authors suggest that the photo reduction is the dominant mechanism responsible for the changes in conductivity of In 2O 3 films.