Growth of thin films of zinc oxide by ion beam sputtering

The article discusses the growth of thin films of zinc oxide (ZnO) using ion beam sputtering. Coating growth was carried out by sputtering a zinc oxide (ZnO) target with a beam of argon ions (Ar+) in a vacuum setup with plasma ion sources. The features of the growth processes were investigated. Modeling was conducted, and theoretical sputtering coefficients were calculated according to the theory of Zigmund. The experiment and calculations allowed for the recommendation of optimal parameters for the growth processes.