Influence of Small Anode Discharge on the Properties of Thin Titanium-Containing Films Obtained by Magnetron Sputtering with Subsequent Annealing

This paper proposes a modified magnetron sputtering method using an additional discharge near the substrate created by a small anode. This allows controlling the concentration of the charged particle flux entering the substrate, which allows controlling the properties of the resulting coatings. The titanium films obtained by this method were annealed in air and nitrogen at different temperatures. The resulting titanium-containing films demonstrated properties dependent on the properties of the initial film. It was revealed how the density of the initial films affects the transformation kinetics during annealing.