An investigation into the SHS compacting of multicomponent targets based on TiB for cathodic arc deposition

The effect of aluminum and silicon-containing compounds of titanium-boron system on technological properties of SHS-compacted targets for arc-PVD has been investigated. The charge mixture of the working layer should be prepared based upon the sufficient content of titanium matrix in the synthesis products to obtain defect-free workpieces and targets. Estimated mass concentration of free titanium in the Ti - B - Al and Ti - B - Si systems should be at least 35% and 10% respectively. All the studied compositions of the Ti - B - Al - Si system are non-manufacturable both at SHS compacting of multilayer workpieces and at the machining.